Reve 2.1 Layout
Reve 2.1 Layout separates composition from rendering so follow-up edits can preserve and reshape the image structure. Use it for posters, editorial layouts, controlled scenes, and iterative composition work.
Best for
- layout
- composition
- references
- iterative edits
Use when
- You want to refine a composition over several natural-language edits.
- You need wide, tall, banner, or other specialized aspect ratios.
- You want up to eight ordered image references in one generation.
- You are building a poster, editorial image, or controlled multi-subject scene.
Avoid when
- You need mask painting or a visual region editor.
- You need the lower-cost Standard Reve path.
Inputs
- prompt
- up to eight ordered reference images
Outputs
- image
- hidden reusable layout metadata
DayGen surfaces
- /image/create
- QuickEdit
- Agent image generation
Available settings
- Aspect Ratio
- Auto, 1:1 (Square), 16:9 (Wide), 9:16 (Story), 4:3 (Classic), 3:4 (Portrait), 3:2 (Photo), 2:3 (Poster), 5:4 (Gallery), 4:5 (Feed), 21:9 (Ultrawide), 17:9 (Cinema), 2:1 (Panorama), 3:1 (Banner), 4:1 (Strip), 1:2 (Tall), 1:3 (Tall Banner), 1:4 (Vertical Strip)
- Quality
- Model-defined
- Batch Size
- 1–4
- References
- Up to 8 images